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Proceedings Paper

Evaluation of 157-nm resist structure: outgassing relationship using in situ QCM technique
Author(s): Masamitsu Shirai; Toyofumi Shinozuka; Shinichi Takashiba; Yusuke Horiguchi; Shigeo Irie; Toshiro Itani
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Paper Abstract

An in-situ quartz crystal microbalance (QCM) method was applied to quantitatively measure the outgassing from 157-nm resists, i.e., fluorinated cyclopolymer (FCP) and its derivatives blocked with alkoxymethyl ether units, in real time. The frequency change of quartz crystal coated with resist films was monitored during exposure and the mass desorbed from the resist films was calculated as amounts of outgassing. The sensitivity of the present QCM system was about 1 ng. The outgassing rate from FCP was much lower than FCP blocked with alkoxymethyl ether moiety, suggesting that the outgassing was mainly caused from the blocking units. Acidic components in outgassing were quantitatively measured by in-situ QCM technique using the quartz crystal coated with poly(4-vinylpyridine) (PVP) or a copolymer (DMEST) of 2-(dimethylamino)ethyl methacrylate and styrene. The acidic materials adsorbed on quart crystal were monitored during exposure and the mass adsorbed was calculated. The amount of acidic compounds in outgassing was dependent on fluorine content of the resist polymers.

Paper Details

Date Published: 14 May 2004
PDF: 8 pages
Proc. SPIE 5376, Advances in Resist Technology and Processing XXI, (14 May 2004); doi: 10.1117/12.533649
Show Author Affiliations
Masamitsu Shirai, Osaka Prefecture Univ. (Japan)
Toyofumi Shinozuka, Osaka Prefecture Univ. (Japan)
Shinichi Takashiba, Osaka Prefecture Univ. (Japan)
Yusuke Horiguchi, Osaka Prefecture Univ. (Japan)
Shigeo Irie, Semiconductor Leading Edge Technologies, Inc. (Japan)
Toshiro Itani, Semiconductor Leading Edge Technologies, Inc. (Japan)


Published in SPIE Proceedings Vol. 5376:
Advances in Resist Technology and Processing XXI
John L. Sturtevant, Editor(s)

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