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Proceedings Paper

Investigation of stray light characteristic by multiple Gaussian modeling and its OPC application
Author(s): Ho-Chul Kim; Dong-Seok Nam; Gi-Sung Yeo; Suk-Joo Lee; Sang-Gyun Woo; Han-Ku Cho; Woo-Sung Han
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Paper Abstract

Stray light is analyzed by scattering range. For the short range, stray light distributes as 1/r4 and comes from aberration. For the mid range and the long range, in the assumption of Gaussian distribution, characteristic scattering length of specific tools is estimated. EOR is proposed which contains information of layer geometry and scattering range characteristic of flare. To minimize CD errors from OPC, flare level and EOR should be considered in the OPC procedure.

Paper Details

Date Published: 28 May 2004
PDF: 4 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.533373
Show Author Affiliations
Ho-Chul Kim, Samsung Electronics Co., Ltd. (South Korea)
Dong-Seok Nam, Samsung Electronics Co., Ltd. (South Korea)
Gi-Sung Yeo, Samsung Electronics Co., Ltd. (South Korea)
Suk-Joo Lee, Samsung Electronics Co., Ltd. (South Korea)
Sang-Gyun Woo, Samsung Electronics Co., Ltd. (South Korea)
Han-Ku Cho, Samsung Electronics Co., Ltd. (South Korea)
Woo-Sung Han, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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