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Proceedings Paper

At the limit of nondispersive micro- and nanofocusing mirror optics
Author(s): Gene E. Ice; Eliot David Specht; Jonathan Z. Tischler; Ali M. Khounsary; Lahsen Assoufid; Chian Liu
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Paper Abstract

We describe x-ray Kirkpatrick-Baez mirror designs with the potential to produce hard x-ray beams of 40 nm or smaller. The x-ray quality mirrors required to achieve the desired performance can be fabricated by differential deposition on ultra-smooth surfaces, or by differential polishing. Various mirror systems designed for nanofocusing to ~40 nm and below are compared. The performance limits of total-external-reflection mirrors are compared with the limits of multilayer mirrors that can potentially focus to an even smaller spot size. The advantages of side-by-side Kirkpatrick-Baez mirrors are evaluated and more advanced, four-mirror systems with significantly greater geometrical demagnification are discussed. These systems can potentially reach 5 - 20 nm focal spot sizes for multilayer and total-external-reflection optics respectively.

Paper Details

Date Published: 29 December 2003
PDF: 8 pages
Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); doi: 10.1117/12.533345
Show Author Affiliations
Gene E. Ice, Oak Ridge National Lab. (United States)
Eliot David Specht, Oak Ridge National Lab. (United States)
Jonathan Z. Tischler, Oak Ridge National Lab. (United States)
Ali M. Khounsary, Argonne National Lab. (United States)
Lahsen Assoufid, Argonne National Lab. (United States)
Chian Liu, Argonne National Lab. (United States)


Published in SPIE Proceedings Vol. 5347:
Micromachining Technology for Micro-Optics and Nano-Optics II
Eric G. Johnson; Gregory P. Nordin, Editor(s)

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