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Proceedings Paper

Optimization and apodization of aerial images at high NA in imaging interferometic lithography
Author(s): Thanis M. Tridhavee; Balu Santhanam; Steven R. J. Brueck
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Paper Abstract

Imaging Interferometric Lithography (IIL) offers several optimization parameters such as pupil filtering, parsing of frequency coverage, polarization control, and multiple exposure dosage ratios. We discuss the optimal frequency coverages for IIL at NA = .9 and the effects of the dark field (quadratic image autocorrelation terms) on the aerial image under pupil filtering. Next, comparisons are made of exposure latitudes for various dosage ratios and exposures for several weighted errors under different conditions. Lastly, apodization of the pupil filters is considered and shown to alleviate artifacts associated with Gibbs phenomena at hard frequency stops and improve overall image fidelity.

Paper Details

Date Published: 28 May 2004
PDF: 11 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.533149
Show Author Affiliations
Thanis M. Tridhavee, Univ. of New Mexico (United States)
Balu Santhanam, Univ. of New Mexico (United States)
Steven R. J. Brueck, Univ. of New Mexico (United States)
CHTM/Univ. of New Mexico (United States)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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