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Proceedings Paper

New method for high-accuracy measurements of the internal transmittance in the deep-ultraviolet spectral region using prism-shaped samples
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Paper Abstract

A method capable of measuring the internal transmittance Ti of fused silica @193 nm with a precision better than 0.01 %/cm (3σ) is presented. The basic idea is to vary the optical pathlength during the measurement within one and the same prism-shaped sample by moving the latter through the optical test beam. In comparison to the standard multiple-sample experiment this greatly relaxes the requirements for the repeatability of surface preparation. Lack of any standards makes it currently impossible to determine the absolute accuracy experimentally. However, calculations indicate that it is very likely within 0.02 %/cm (3σ). The application to materials and wavelengths other than what were chosen here for demonstration is straightforward.

Paper Details

Date Published: 28 May 2004
PDF: 6 pages
Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); doi: 10.1117/12.533116
Show Author Affiliations
Ulrich Neukirch, Corning Inc. (United States)
Xinghua Li, Corning Inc. (United States)


Published in SPIE Proceedings Vol. 5377:
Optical Microlithography XVII
Bruce W. Smith, Editor(s)

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