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Proceedings Paper

Debris-free low-cost commercial EUV source for at-wavelength metrology
Author(s): Andre Egbert; Boris Tkachenko; Stefan Becker; Boris N. Chichkov
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Paper Abstract

A commercial extreme ultraviolet (EUV) source for at-wavelength metrology is developed. The source concept is based on the transfer of advanced microfocus x-ray tube technology into the EUV spectral range. This concept allows the realization of a compact, debris-free, and long-term stable EUV source. In the EUV tube, silicon targets are used to generate radiation at 13.5 nm. Detailed characteristics of the source performance are reported and different applications of the source in the field of at-wavelength metrology are presented.

Paper Details

Date Published: 20 May 2004
PDF: 9 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.533019
Show Author Affiliations
Andre Egbert, phoenix EUV Systems + Services GmbH (Germany)
Boris Tkachenko, phoenix EUV Systems + Services GmbH (Germany)
Stefan Becker, phoenix EUV Systems + Services GmbH (Germany)
Boris N. Chichkov, Laser Zentrum Hannover e.V. (Germany)

Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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