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Proceedings Paper

Birefringence control and manipulation in silicon-oxynitride
Author(s): Folkert Horst; Bert Offrein; Roger Dangel; Dorothea Wiesmann; Ton Koster; Gian-Luca Bona
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Paper Abstract

This paper describes methods to control and manipulate birefringence in SiliconOxyNitride waveguides and devices. Each method is demonstrated by measurements on example devices. The methods and devices that will be covered are: Reduction of heater induced birefringence in a dynamic gain equalizer by heater design or etched trenches. Reduction of polarization mode dispersion in a tunable dispersion compensator by UV trimming of residual waveguide birefringence. Polarization conversion using integrated optical half-wave-plates, fabricated by etching trenches at one side of a waveguide. Polarization splitting using waveguide sections with specified birefringence, obtained by etched trenches at both sides of the waveguide.

Paper Details

Date Published: 1 July 2004
PDF: 12 pages
Proc. SPIE 5357, Optoelectronic Integration on Silicon, (1 July 2004); doi: 10.1117/12.532877
Show Author Affiliations
Folkert Horst, IBM Zurich Research Lab. (Switzerland)
Bert Offrein, IBM Zurich Research Lab. (Switzerland)
Roger Dangel, IBM Zurich Research Lab. (Switzerland)
Dorothea Wiesmann, IBM Zurich Research Lab. (Switzerland)
Ton Koster, NKT Integration (Denmark)
Gian-Luca Bona, IBM Zurich Research Lab. (Switzerland)

Published in SPIE Proceedings Vol. 5357:
Optoelectronic Integration on Silicon
David J. Robbins; Ghassan E. Jabbour, Editor(s)

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