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Proceedings Paper

Development and implementation of advanced process control algorithms to support lithography critical dimension control
Author(s): Joshua S. Hugg; Scot Goernitz; Lingyu Chen; Carl M. Matthews; Kevin T. McCarthy; Mani Janakiram
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Proc. SPIE 5378, Data Analysis and Modeling for Process Control, ; doi: 10.1117/12.532740
Show Author Affiliations
Joshua S. Hugg, Intel Corp. (United States)
Scot Goernitz, Intel Corp. (United States)
Lingyu Chen, Intel Corp. (United States)
Carl M. Matthews, Intel Corp. (United States)
Kevin T. McCarthy, Intel Corp. (United States)
Mani Janakiram, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 5378:
Data Analysis and Modeling for Process Control
Kenneth W. Tobin, Editor(s)

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