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Proceedings Paper

Silanized polymeric working stamps for hot embossing lithography
Author(s): Matthias Wissen; N. Bogdanski; R. Jerzy; Z. E. Berrada; Marion Fink; Freimut Reuther; Thomas Glinsner; Hella-Christin Scheer
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Paper Abstract

Pattern replication into curable imprint resists by hot embossing offers the opportunity to use the replication after crosslinking as a working-stamp. The replications of a 4” Si stamp into the thermoset imprint polymer mr-I 9000R-XP with a commercial hot embossing system (EVGroup) have been coated with an anti-adhesive layer (trichlorosilane) from the gas-phase at ambient pressure. The investigation of the quality and durability of these anti-adhesive coatings reveals that the contact angles and the replication performance of the working-stamps were independent from the fact whether the polymer was already cured or still thermoplastic during the anti-adhesive coating. The prepared 4” working-stamps themselves have been successfully replicated into a low glass transition temperature resist (mr-L 6000.5 XP) and into PMMA.

Paper Details

Date Published: 20 May 2004
PDF: 8 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.532733
Show Author Affiliations
Matthias Wissen, Univ. of Wuppertal (Germany)
N. Bogdanski, Univ. of Wuppertal (Germany)
R. Jerzy, Univ. of Wuppertal (Germany)
Z. E. Berrada, Univ. of Wuppertal (Germany)
Marion Fink, micro resist technology GmbH (Germany)
Freimut Reuther, micro resist technology GmbH (Germany)
Thomas Glinsner, EV Group (Austria)
Hella-Christin Scheer, Univ. of Wuppertal (Germany)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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