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Proceedings Paper

High-sensitivity material systems for two-photon three dimensional microfabrication
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Paper Abstract

A photoacid generator (PAG) is described that can be efficiently activated by two-photon excitation and can be used for high-sensitivity three-dimensional micro-patterning of acid-sensitive media. The molecule has been specifically engineered to have both a large peak two-photon absorption cross section (δ = 690 x 10-50 cm4 s photon-1 at 705 nm) and a high quantum yield for the photochemical generation of acid (φH+ ≈ 0.5). Under near-infrared laser irradiation, the PAG produces acid subsequent to two-photon excitation and initiates the polymerization of epoxides. The PAG was used in conjunction with the epoxide resist SU-8 for negative-tone three-dimensional microfabrication and was incorporated into a specially formulated chemically amplified resist for positive-tone fabrication of a three-dimensional grating structure. These material systems expand the potential of three-dimensional microfabrication as a tool for manufacturing micro-electromechanical systems, micro-fluidics, and micro-optical structures.

Paper Details

Date Published: 29 December 2003
PDF: 7 pages
Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); doi: 10.1117/12.532614
Show Author Affiliations
Stephen M. Kuebler, CREOL/Univ. of Central Florida (United States)
Joseph W. Perry, Georgia Institute of Technology (United States)
Seth R. Marder, Georgia Institute of Technology (United States)
Christopher Kemper Ober, Cornell Univ. (United States)
Kevin L. Braun, Univ. of Arizona (United States)
Tianyue Yu, Cornell Univ. (United States)
Wenhui Zhou, Univ. of Arizona (United States)

Published in SPIE Proceedings Vol. 5347:
Micromachining Technology for Micro-Optics and Nano-Optics II
Eric G. Johnson; Gregory P. Nordin, Editor(s)

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