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Proceedings Paper

Improved vapor-phase deposition technique for antistiction monolayers
Author(s): Robert W. Ashurst; Carlo Carraro; Jeff D. Chinn; Victor Fuentes; Boris Kobrin; Roya Maboudian; Romuald Nowak; Richard Yi
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Paper Abstract

We have developed an improved vapor-phase deposition method and an apparatus for the wafer-scale coating of monolayer films typically used in anti-stiction applications. The method consists of a surface preparation step using an O2 plasma followed by the tunable deposition of a monolayer film in the same reactor. This process has been successfully applied to MEMS test structures and has demonstrated superior anti-stiction performance. The deposition process allows tuning of the film properties by the precise metering of the precursor and a catalyst as part of the process control scheme. The anti-stiction monolayer film deposited from dimethyldichlorosilane (DDMS), tridecafluoro-1,1,2,2-tetrahydrooctyltrichlorosilane (FOTS), and heptadecafluoro-1,1,2,2-tetrahydrodecyltrichlorosilane (FDTS) were characterized using contact angle analysis, atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS). The coefficient of static friction was measured using a sidewall test device and the work of adhesion using a cantilever beam array. The results showed that excellent quality, uniformity, and reproducibility could be achieved across a whole wafer using this method and equipment.

Paper Details

Date Published: 30 December 2003
PDF: 8 pages
Proc. SPIE 5342, Micromachining and Microfabrication Process Technology IX, (30 December 2003); doi: 10.1117/12.531798
Show Author Affiliations
Robert W. Ashurst, Univ. of California/Berkeley (United States)
Carlo Carraro, Univ. of California/Berkeley (United States)
Jeff D. Chinn, Applied Microstructures, Inc. (United States)
Victor Fuentes, Applied Microstructures, Inc. (United States)
Boris Kobrin, Applied Microstructures, Inc. (United States)
Roya Maboudian, Univ. of California/Berkeley (United States)
Romuald Nowak, Applied Microstructures, Inc. (United States)
Richard Yi, Applied Microstructures, Inc. (United States)


Published in SPIE Proceedings Vol. 5342:
Micromachining and Microfabrication Process Technology IX
Mary Ann Maher; Jerome F. Jakubczak, Editor(s)

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