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Proceedings Paper

Microstructure modification of zirconium oxide thin films for application in laser systems
Author(s): Jerzy Ciosek; Wojciech Paszkowicz; Piotr Pankowski; Jozef Firak; Urszula Stanislawek; Roman Ostrowski
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Paper Abstract

Thin films of zirconia were deposited on quartz substrates by conventional reactive electron beam deposition and ion-assisted deposition. The influence of the post-deposition annealing between 400°C and 900°C on the structural and optical properties and on the surface morpohology was investigated. It is shown that after post-deposition annealing the ZrO2 films the degree of order becomes higher. The contribution of the monoclinic phase increases with the rise of annealing temperature. The post-deposition annealed (temperature range: 700-900°C) samples exhibit lower threshold to damage for the radiation of pulse Nd:YAG laser. Correlation between the observed film properties and laser damage threshold is discussed.

Paper Details

Date Published: 6 October 2003
PDF: 4 pages
Proc. SPIE 5230, Laser Technology VII: Progress in Lasers, (6 October 2003); doi: 10.1117/12.531767
Show Author Affiliations
Jerzy Ciosek, Military Univ. of Technology (Poland)
Wojciech Paszkowicz, Institute of Physics (Poland)
Piotr Pankowski, Institute of Physics (Poland)
Jozef Firak, Military Univ. of Technology (Poland)
Urszula Stanislawek, Military Univ. of Technology (Poland)
Roman Ostrowski, Military Univ. of Technology (Poland)


Published in SPIE Proceedings Vol. 5230:
Laser Technology VII: Progress in Lasers
Wieslaw L. Wolinski; Zdzislaw Jankiewicz; Ryszard S. Romaniuk, Editor(s)

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