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Proceedings Paper

Plasma etching of ZnO: a review
Author(s): Karen J. Nordheden
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Paper Abstract

A review of the current literature on plasma etching of ZnO is presented. The etch rates as a function of etch conditions in Cl2-based BCl3-based and CH4-based and related chemistries are reviewed. Resultant surface morphology, anisotropy, surface stoichiometry and band edge photoluminescence results are also discussed.

Paper Details

Date Published: 6 July 2004
PDF: 6 pages
Proc. SPIE 5359, Quantum Sensing and Nanophotonic Devices, (6 July 2004); doi: 10.1117/12.531391
Show Author Affiliations
Karen J. Nordheden, Univ. of Kansas/Lawrence (United States)

Published in SPIE Proceedings Vol. 5359:
Quantum Sensing and Nanophotonic Devices
Manijeh Razeghi; Gail J. Brown, Editor(s)

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