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Proceedings Paper

Experimental investigation of beam dry etching mechanism of polymer using N2 gas
Author(s): Kozo Taguchi; Masahiro Ikeda
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Proc. SPIE 5356, Optoelectronic Integrated Circuits VI, ; doi: 10.1117/12.530993
Show Author Affiliations
Kozo Taguchi, Ritsumeikan Univ. (Japan)
Masahiro Ikeda, Fukuyama Univ. (Japan)


Published in SPIE Proceedings Vol. 5356:
Optoelectronic Integrated Circuits VI
Louay A. Eldada, Editor(s)

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