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Proceedings Paper

Toward multifunctional optical integration: an adaptive lithographic method for patterning optical structures
Author(s): Samhita Dasgupta; Min-Yi Shih; Thomas Gorczyca; Ernest Balch; Glenn Claydon; Leonard Douglas; Todd Tolliver; Matthew Nielsen
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Paper Abstract

A new method of interconnecting various optoelectronic components is discussed. Offset error up to 25 microns can be corrected to achieve single mode alignment accuracies. Several planar optical devices were photocomposed using the adaptive photolithographic method and these have been shown to perform with the desired characteristics.

Paper Details

Date Published: 18 June 2004
PDF: 10 pages
Proc. SPIE 5351, Organic Photonic Materials and Devices VI, (18 June 2004); doi: 10.1117/12.529934
Show Author Affiliations
Samhita Dasgupta, GE Global Research Ctr. (United States)
Min-Yi Shih, GE Global Research Ctr. (United States)
Thomas Gorczyca, GE Global Research Ctr. (United States)
Ernest Balch, GE Global Research Ctr. (United States)
Glenn Claydon, GE Global Research Ctr. (United States)
Leonard Douglas, GE Global Research Ctr. (United States)
Todd Tolliver, GE Global Research Ctr. (United States)
Matthew Nielsen, GE Global Research Ctr. (United States)


Published in SPIE Proceedings Vol. 5351:
Organic Photonic Materials and Devices VI
James G. Grote; Toshikuni Kaino, Editor(s)

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