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Proceedings Paper

Surface microfabrication of fused silica glass by UV laser irradiation
Author(s): Hiroyuki Niino; Yoshizo Kawaguchi; Tadatake Sato; Aiko Narazaki; Ximing Ding; Ryozo Kurosaki
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Paper Abstract

Surface micro-structuring of fused silica glass plates was performed by single-shot irradiation with a single-mode laser beam from a diode-pumped solid state UV laser at 355 nm. Well-defined micropattern without debris and microcrack formations around the etched area was fabricated by laser ablation with a focused laser-beam in the ambient air. The time-resolved optical emission spectra of plume were measured to elucidate the ablation behavior of silica glass induced by nanosecond-pulsed laser irradiation at 355 nm where absorption of silica glass is negligibly small. This method is suitable for rapid prototyping of surface microstructuing without a clean room environment.

Paper Details

Date Published: 15 July 2004
PDF: 6 pages
Proc. SPIE 5339, Photon Processing in Microelectronics and Photonics III, (15 July 2004); doi: 10.1117/12.529864
Show Author Affiliations
Hiroyuki Niino, National Institute of Advanced Industrial Science and Technology (Japan)
Yoshizo Kawaguchi, National Institute of Advanced Industrial Science and Technology (Japan)
Tadatake Sato, National Institute of Advanced Industrial Science and Technology (Japan)
Aiko Narazaki, National Institute of Advanced Industrial Science and Technology (Japan)
Ximing Ding, National Institute of Advanced Industrial Science and Technology (Japan)
Ryozo Kurosaki, National Institute of Advanced Industrial Science and Technology (Japan)


Published in SPIE Proceedings Vol. 5339:
Photon Processing in Microelectronics and Photonics III
Jan J. Dubowski; Peter R. Herman; Friedrich G. Bachmann; Willem Hoving; Jim Fieret; David B. Geohegan; Frank Träger; Kunihiko Washio; Alberto Pique; Xianfan Xu; Tatsuo Okada, Editor(s)

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