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Proceedings Paper

Directly UV-photopatternable PLZT thin films prepared with the sol-gel technique
Author(s): Terho Kololuoma; Jussi Hiltunen; Markus Tuomikoski; Jyrki Lappalainen; Juha T. Rantala
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Paper Abstract

In this study, the sol-gel process to fabricate directly UV-photopatternable lanthanum-doped lead zirconate titanate (PLZT) films was investigated. Photosensitive films were obtained via chemical methacrylic acid modification of metal organic PLZT precursors. Spin-on deposited films were patterned using direct UV-photolithography process. Patterned films were annealed in air, in order to obtain perovskite type crystalline material. AFM and XRD techniques were used for the characterization of the material and fabricated structures. The sol-gel processed PLZT films had good crystallinity, they were crack-free, and had low surface roughness. The films exhibit electro-optic effect being therefore interesting to be used in active integrated optic devices.

Paper Details

Date Published: 28 May 2004
PDF: 7 pages
Proc. SPIE 5355, Integrated Optics: Devices, Materials, and Technologies VIII, (28 May 2004); doi: 10.1117/12.528803
Show Author Affiliations
Terho Kololuoma, VTT Elektroniikka (Finland)
Jussi Hiltunen, VTT Elektroniikka (Finland)
Markus Tuomikoski, VTT Elektroniikka (Finland)
Jyrki Lappalainen, Univ. of Oulu (Finland)
Juha T. Rantala, Silecs Oy (Finland)


Published in SPIE Proceedings Vol. 5355:
Integrated Optics: Devices, Materials, and Technologies VIII
Yakov Sidorin; Ari Tervonen, Editor(s)

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