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Proceedings Paper

Application of spatial light modulators for microlithography
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Paper Abstract

The Fraunhofer IPMS and Micronic Laser Systems AB have developed a technology for the maskless DUV microlithography using spatial light modulation (SLM). This technology uses an array of micromirrors as a pro-programable mask, which allows writing up to 1 million pixels with a framerate of up to 2 kHz. The SLM is fabricated at the IPMS using its high-voltage CMOS process. The mirrors are fabricated by surface micromachining using a polymer as sacrificial layer. The mirrors are operated in an analog mode to allow sub-pixel placement of the features.

Paper Details

Date Published: 24 January 2004
PDF: 8 pages
Proc. SPIE 5348, MOEMS Display and Imaging Systems II, (24 January 2004); doi: 10.1117/12.528798
Show Author Affiliations
Ulrike A Dauderstaedt, Fraunhofer-Institut fuer Photonische Mikrosysteme (Germany)
Peter Duerr, Fraunhofer-Institut fuer Photonische Mikrosysteme (Germany)
Tord Karlin, Micronic Laser Systems AB (Sweden)
Harald Schenk, Fraunhofer-Institut fuer Photonische Mikrosysteme (Germany)
Hubert Lakner, Fraunhofer-Institut fuer Photonische Mikrosysteme (Germany)


Published in SPIE Proceedings Vol. 5348:
MOEMS Display and Imaging Systems II
Hakan Urey; David L. Dickensheets, Editor(s)

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