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Proceedings Paper

A large-aperture high-energy laser system for optics and optical component testing
Author(s): Mike C. Nostrand; Timothy L. Weiland; Ronald L. Luthi; James L. Vickers; Walter D. Sell; Joel A. Stanley; John Honig; Jerome Auerbach; Richard P. Hackel; Paul J. Wegner
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Paper Abstract

A large aperture, kJ-class, multi-wavelength Nd-glass laser system has been constructed at Lawrence Livermore National Lab which has unique capabilities for studying a wide variety of optical phenomena. The master-oscillator, power-amplifier (MOPA) configuration of this "Optical Sciences Laser" (OSL) produces 1053 nm radiation with shaped pulse lengths which are variable from 0.1 - 100 ns. The output can be frequency doubled or tripled with high conversion efficiency with a resultant 100 cm2 high quality output beam. This facility can accommodate prototype hardware for large-scale inertial confinement fusion lasers allowing for investigation of integrated system issues such as optical lifetime at high fluence, optics contamination, compatibility of non-optical materials, and laser diagnostics.

Paper Details

Date Published: 10 June 2004
PDF: 9 pages
Proc. SPIE 5273, Laser-Induced Damage in Optical Materials: 2003, (10 June 2004); doi: 10.1117/12.528327
Show Author Affiliations
Mike C. Nostrand, Lawrence Livermore National Lab. (United States)
Timothy L. Weiland, Lawrence Livermore National Lab. (United States)
Ronald L. Luthi, Lawrence Livermore National Lab. (United States)
James L. Vickers, Lawrence Livermore National Lab. (United States)
Walter D. Sell, Lawrence Livermore National Lab. (United States)
Joel A. Stanley, Lawrence Livermore National Lab. (United States)
John Honig, Lawrence Livermore National Lab. (United States)
Jerome Auerbach, Lawrence Livermore National Lab. (United States)
Richard P. Hackel, Lawrence Livermore National Lab. (United States)
Paul J. Wegner, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 5273:
Laser-Induced Damage in Optical Materials: 2003
Gregory J. Exarhos; Arthur H. Guenther; Norbert Kaiser; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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