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Proceedings Paper

The analysis of line profile in laser direct writing process
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Paper Abstract

In the analysis of line profile in single point Laser Direct Writing process, the line profile errors will increase if we replace the exposure dose distribution by the intensity distribution of focus plane because there are differences between them. The exposure dose distribution in the photoresist is analyzed as well as the line profile after developed. The experimental results agree well with the theoretical forecast.

Paper Details

Date Published: 19 November 2003
PDF: 2 pages
Proc. SPIE 4829, 19th Congress of the International Commission for Optics: Optics for the Quality of Life, (19 November 2003); doi: 10.1117/12.527606
Show Author Affiliations
Yongjun Xie, Changchun Institute of Optics and Fine Mechanics (China)
Zhenwu Lu, Changchun Institute of Optics and Fine Mechanics (China)
Fengyou Li, Changchun Institute of Optics and Fine Mechanics (China)
Zhicheng Weng, Changchun Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 4829:
19th Congress of the International Commission for Optics: Optics for the Quality of Life
Giancarlo C. Righini; Anna Consortini, Editor(s)

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