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Proceedings Paper

New technique for Si-based microphotonic components fabrication
Author(s): Dana Cristea; Elena Manea
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Paper Abstract

This paper presents the experiments we have performed to obtain microphotonic components using a new technique: the anisotropic wet etching of Si <111>-oriented wafers. The anisotropic etching was combined with an isotropic pre-etch step, followed or not by sidewall passivation. The influence of the mask orientation and layout on the shape and size of the etched cavity was studied and then the masks and the technological process for fabrication of S3N4/SiO2 and c-Si freestanding structures were established. Movable Si3N4 micromirrors, SiO2 or c-Si waveguides were obtained using a low-cost technological process. These components can be further integrated with optoelectronic devices on a silicon substrate.

Paper Details

Date Published: 19 November 2003
PDF: 3 pages
Proc. SPIE 4829, 19th Congress of the International Commission for Optics: Optics for the Quality of Life, (19 November 2003); doi: 10.1117/12.527074
Show Author Affiliations
Dana Cristea, National Institute for Research and Development in Microtechnologies (Romania)
Elena Manea, National Institute for Research and Development in Microtechnologies (Romania)


Published in SPIE Proceedings Vol. 4829:
19th Congress of the International Commission for Optics: Optics for the Quality of Life

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