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Proceedings Paper

Lateral shearing interferometer for measuring refractive index of silicon
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Paper Abstract

A simple lateral shearing interferometer is proposed for measuring refractive index of thin parallel plate silicon sample. The rotating sample works as lateral shearing element. As the sample rotates a continuous lateral shearing is obtained owing to the change of the optical path difference (OPD) between the transmitted beam and that first reflected by the surface sample. The recorded interferometric signal is Fourier-transform analyzed and the phase change is determined as a function of the rotating angle. If the thickness of the silicon sample is known the method provides accurate measurement of the refractive index. (Summary only available)

Paper Details

Date Published: 19 November 2003
PDF: 3 pages
Proc. SPIE 4829, 19th Congress of the International Commission for Optics: Optics for the Quality of Life, (19 November 2003); doi: 10.1117/12.526895
Show Author Affiliations
Giuseppe Coppola, Istituto per la Microelettronica e Microsistemi (Italy)
Pietro Ferraro, Istituto per la Microelettronica e Microsistemi (Italy)
Sergio M. De Nicola, Istituto di Cibernetica (Italy)
Mario Iodice, Istituto per la Microelettronica e Microsistemi (Italy)


Published in SPIE Proceedings Vol. 4829:
19th Congress of the International Commission for Optics: Optics for the Quality of Life
Giancarlo C. Righini; Anna Consortini, Editor(s)

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