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Proceedings Paper

Waveguide sidewall roughness estimation via shape-from-shading surface reconstruction of SEM pictures
Author(s): Alexis G. Bony; Andre Heid; Yoshitate Takakura; Klaus Satzke; Patrick Meyrueis
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Paper Abstract

A shape-from-shading algorithm is applied to topography images of silica waveguide sidewalls coming from a Scanning Electron Microscope. The approach is found appropriate to restitute the sidewall profile. The reconstructed relief obtained is then height calibrated via Line Edge Roughness measurement. The technique enables thereafter roughness measurement at arbitrary positions on the sidewall, with the advantage of providing non-destructive testing on full wafer.

Paper Details

Date Published: 28 May 2004
PDF: 8 pages
Proc. SPIE 5355, Integrated Optics: Devices, Materials, and Technologies VIII, (28 May 2004); doi: 10.1117/12.525049
Show Author Affiliations
Alexis G. Bony, Alcatel SEL AG (Germany)
Photonic Systems Lab. (France)
Andre Heid, Alcatel SEL AG (Germany)
Yoshitate Takakura, TRIO/LSIIT (France)
Klaus Satzke, Alcatel SEL AG (Germany)
Patrick Meyrueis, Photonic Systems Lab. (France)


Published in SPIE Proceedings Vol. 5355:
Integrated Optics: Devices, Materials, and Technologies VIII
Yakov Sidorin; Ari Tervonen, Editor(s)

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