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Proceedings Paper

Enhancement of surface-damage resistance by removing subsurface damage in fused silica
Author(s): Tomosumi Kamimura; Shigenori Akamatsu; Masashi Yamamoto; Ichiro Yamato; Haruya Shiba; Shinji Motokoshi; Takayasu Sakamoto; Takahisa Jitsuno; Takayuki Okamoto; Kunio Yoshida
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Paper Abstract

The surface-damage resistance of fused silica was enhanced 2.8-fold by removing a subsurface damage. For the conventionally polished fused silica surface, μm-scale subsurface damage and a shallow (20 nm to 100 nm) structurally modified zone produced during grinding and polishing were formed on the top of surface. Several surface etching techniques and super-precise polishing process were used to remove subsurface damage from a fused silica surface. First the conventionally polished surfaces were chemically etched in a buffered HF solution to remove 300μm of surface material, and then super-precise polishing was performed to obtain an optical surface. After that, the polishing compound was removed by using ion-beam etching. The effect of subsurface damage on laser damage resistance was characterized by the measuring of the laser-induced damage threshold (LIDT) for the laser radiations of 1064 nm and 266 nm respectively. For the wavelength of 1064 nm, the effect of the removal of subsurface damage wasn't clearly seen, although the enhancement of surface-damage resistance by the ion-beam etching could be confirmed. However, in the case of 266 nm, enhanced LIDT of 28 J/cm2 was obtained from the subsurface damage removed surface. The surface LIDT increased by 2.8 times compared to that of conventionally polished fused silica surfaces.

Paper Details

Date Published: 10 June 2004
PDF: 6 pages
Proc. SPIE 5273, Laser-Induced Damage in Optical Materials: 2003, (10 June 2004); doi: 10.1117/12.524961
Show Author Affiliations
Tomosumi Kamimura, Kochi National College of Technology (Japan)
Shigenori Akamatsu, Kochi National College of Technology (Japan)
Masashi Yamamoto, Kochi National College of Technology (Japan)
Ichiro Yamato, Kochi National College of Technology (Japan)
Haruya Shiba, Kochi National College of Technology (Japan)
Shinji Motokoshi, Osaka Univ. (Japan)
Takayasu Sakamoto, Osaka Univ. (Japan)
Takahisa Jitsuno, Osaka Univ. (Japan)
Takayuki Okamoto, Okamoto Optics Co. (Japan)
Kunio Yoshida, Osaka Institute of Technology (Japan)


Published in SPIE Proceedings Vol. 5273:
Laser-Induced Damage in Optical Materials: 2003
Gregory J. Exarhos; Arthur H. Guenther; Norbert Kaiser; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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