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Proceedings Paper

Laser-induced bulk damage of impurity-doped silica glasses (Abstract Only)
Author(s): Kunio Yoshida; Y. Tsuboi; S. Yamagishi; Kanyoshi Ochi; S. Kuzuu; Tomosumi Kamimura; Akira Fujinoki; Takayuki Okamoto
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Paper Abstract

Silica glasses can be used as optical material in various applications such as deep-ultraviolet lithography and nuclear fusion, because they have no internal absorption and extremely small defects. In these applications, laser-induced bulk damage is an important factor in practical use. The laser-induced damage threshold (LIDT) is expected to depend on the types and production conditions of silica glasses. In this paper, the LIDT of synthetic fused silica which contains 4~1220ppm of OH, 1.7x1018~2x1019 molecules/cm3 of H2, and 100~3700 ppm of fluorine were studied by irradiating the higher harmonics of Nd:YAG laser at 355 and 266 nm with pulse width of 4 ns. Current experimental results show that the improvement of the LIDT with impurity contained silica glass is possible.

Paper Details

Date Published: 10 June 2004
PDF: 1 pages
Proc. SPIE 5273, Laser-Induced Damage in Optical Materials: 2003, (10 June 2004); doi: 10.1117/12.524858
Show Author Affiliations
Kunio Yoshida, Osaka Institute of Technology (Japan)
Y. Tsuboi, Osaka Institute of Technology (Japan)
S. Yamagishi, Osaka Institute of Technology (Japan)
Kanyoshi Ochi, Osaka Institute of Technology (Japan)
S. Kuzuu, Fukui Univ. (Japan)
Tomosumi Kamimura, Kochi National College of Technology (Japan)
Akira Fujinoki, Shin-Etsu Quartz Co., Ltd. (Japan)
Takayuki Okamoto, Okamoto Optics Co. (Japan)

Published in SPIE Proceedings Vol. 5273:
Laser-Induced Damage in Optical Materials: 2003
Gregory J. Exarhos; Arthur H. Guenther; Norbert Kaiser; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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