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Proceedings Paper

Fabrication and characterization of high Q microresonators using thin plate mechanical mode
Author(s): Jean-Rene Coudevylle; Skandar Basrour; Michel de Labachelerie
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Paper Abstract

The growing place of electronics devices in our society increases the demand of small devices such as RF filters, time references and oscillators. The aim of this work concerns the design and characterization of a new kind of crystalline silicon microresonator fabricated using a DRIE (Deep Reactive Ion Etching) technique. This device can be fabricated by IC compatible techniques. This kind of microresonators is electrostatically actuated and uses a contour or Lamé mode as fundamental mode of vibration. Its size gives the resonant frequency and behavior. The mechanical characterization of one microresonator is carried out using an optical bench set-up. The first results obtained on a device show a high Q factor in air close to 1000 at the resonant frequency of 10.3 MHz.

Paper Details

Date Published: 23 December 2003
PDF: 11 pages
Proc. SPIE 5343, Reliability, Testing, and Characterization of MEMS/MOEMS III, (23 December 2003); doi: 10.1117/12.524751
Show Author Affiliations
Jean-Rene Coudevylle, Lab. de Physique et Metrologie des Oscillateurs, CNRS (France)
Skandar Basrour, Lab. TIMA (France)
Michel de Labachelerie, Lab. de Physique et Metrologie des Oscillateurs, CNRS (France)

Published in SPIE Proceedings Vol. 5343:
Reliability, Testing, and Characterization of MEMS/MOEMS III
Danelle M. Tanner; Rajeshuni Ramesham, Editor(s)

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