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Proceedings Paper

Investigation of bulk laser damage and absorption of laser light in CsLiB6O10 crystals (Abstract Only)
Author(s): Tomosumi Kamimura; Masashi Yamamoto; Shigenori Akamatsu; Muneyuki Nishioka; Masashi Yoshimura; Yusuke Mori; Takatomo Sasaki; Kunio Yoshida
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Paper Abstract

High-power solid-state ultraviolet (UV) lasers by using a have been in high demand because of their convenient operation procedure. An effective technique for UV generation is cascaded sum-frequency generation pumped by the output of near-IR solids-state lasers. The performance of such solid-state UV lasers appears to depend on the ability and reliability of nonlinear optical (NLO) crystals that are employed for laser frequency conversion. Discovery of CsLiB6O10(CLBO) crystals have enabled the production of such practical high-power all solid-state UV lasers. In 2001, UV output power up to 23.0 W by fourth harmonic generation of Nd:YAG laser was achieved. It is fact that laser-induced damage of NLO crystal is a limiting factor on reliable operation of high-power solid-state UV lasers. Bulk laser-induced damage of NLO crystal is related to the crystal's quality. In this paper, we have investigated the relationship among the bulk laser-induced damage threshold (LIDT), dislocation density and absorption of laser light in CLBO crystals with various crystallinity. The bulk LIDT of CLBO increased with decreasing dislocation density. High-quality crystals with a higher LIDT (15 - 18 GW/cm2) have a lower dislocation density of 6.6 x 103/cm2 than that of conventional CLBO (~15.0 x 103/cm2). The relationships between crystal quality and absorption of laser light will be presented.

Paper Details

Date Published: 10 June 2004
PDF: 1 pages
Proc. SPIE 5273, Laser-Induced Damage in Optical Materials: 2003, (10 June 2004); doi: 10.1117/12.524643
Show Author Affiliations
Tomosumi Kamimura, Kochi National College of Technology (Japan)
Masashi Yamamoto, Kochi National College of Technology (Japan)
Shigenori Akamatsu, Kochi National College of Technology (Japan)
Muneyuki Nishioka, Osaka Univ. (Japan)
Masashi Yoshimura, Osaka Univ. (Japan)
Yusuke Mori, Osaka Univ. (Japan)
Takatomo Sasaki, Osaka Univ. (Japan)
Kunio Yoshida, Osaka Institute of Technology (Japan)


Published in SPIE Proceedings Vol. 5273:
Laser-Induced Damage in Optical Materials: 2003
Gregory J. Exarhos; Arthur H. Guenther; Norbert Kaiser; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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