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Proceedings Paper

Gray-scale fabrication of micro-optics in bulk zinc selenide and bulk multispectral zinc sulfide
Author(s): Gregg T. Borek; Daniel M. Brown; Jared A. Shafer
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Paper Abstract

Manufacturing processes have been developed to produce high performance wafer form microoptics in both bulk zinc selenide and bulk multispectral zinc sulfide. Gray scale photolithography techniques have been used to pattern aspheric refractive lenses and beam shaping diffractive structures in wafer form for both of the zinc based II-VI group materials. High density plasma etching recipes have been refined to etch gray scale photoresist patterns into the bulk II-VI wafer materials with controllable selectivity. These IR materials have the advantage over other IR materials of transmitting broadband radiation, including visible band radiation. This very wide transmission band capability (visible to LWIR) permits dual band applications to use the same optical path. The high index of refraction of these materials permits production of higher numerical aperture lenses that have reduced lens sag requirements.

Paper Details

Date Published: 29 December 2003
PDF: 10 pages
Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); doi: 10.1117/12.524580
Show Author Affiliations
Gregg T. Borek, MEMS Optical, Inc (United States)
Daniel M. Brown, Optosensors Technology, Inc. (United States)
Jared A. Shafer, MEMS Optical, Inc. (United States)


Published in SPIE Proceedings Vol. 5347:
Micromachining Technology for Micro-Optics and Nano-Optics II
Eric G. Johnson; Gregory P. Nordin, Editor(s)

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