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Proceedings Paper

Subsurface defects in silica detected by using cathodoluminescence and trapping of electrical charges measurements (Best Poster Presentation)
Author(s): Janick Bigarre
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Paper Abstract

Polishing of optical components produces defects in the subsurface resulting in a decrease in their performance. These defects can be large, like cracks, but also punctual, like oxygen vacancies or non-bridging bonds. Under electronic excitation, punctual defects can produce luminescence (also called cathodoluminescence) and/or can trap electrical charges. In a first work, we have shown that the cathodoluminescence technique is a good way to detect punctual defects (color centers) in silica. In this work, we have improved our cathodoluminescence technique in order to measure the depth profiling of color centers. We have also used the “Charge Contrast Imaging” technique in environmental SEM to observe directly sub-surface scratches generated by polishing.

Paper Details

Date Published: 10 June 2004
PDF: 6 pages
Proc. SPIE 5273, Laser-Induced Damage in Optical Materials: 2003, (10 June 2004); doi: 10.1117/12.524544
Show Author Affiliations
Janick Bigarre, CEA Le Ripault (France)

Published in SPIE Proceedings Vol. 5273:
Laser-Induced Damage in Optical Materials: 2003
Gregory J. Exarhos; Arthur H. Guenther; Norbert Kaiser; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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