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Proceedings Paper

MEMS-based lithography for the fabrication of micro-optical components
Author(s): Lars H. Erdmann; Arnaud Deparnay; Falk Wirth; Robert Brunner
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Paper Abstract

We present a new method for the fabrication of diffractive and refractive microoptical components. The method is suitable for low-volume production, process development, high quality rapid prototyping of optical components and allows the fast experimental test of designs for a wide variety of different microoptical components e.g. computer generated holograms, blazed diffraction gratings or refrative microstructures. Our method is based on employing a computer-controlled digital-multi-micromirror device (DMD) as a switchable projection mask. The DMD is imaged into a photoresist layer using a Carl Zeiss lithography objective with a demagnification of 10:1 and a numerical aperture of 0.32 on the image side. The resulting pixel-size is 1.36 μm x 1.36μm. In comparison with laser direct writing with a single spot our method is a parallel processing of nearly 800000 pixels (1024 x 768).

Paper Details

Date Published: 29 December 2003
PDF: 6 pages
Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); doi: 10.1117/12.524447
Show Author Affiliations
Lars H. Erdmann, Carl Zeiss Jena GmbH (Germany)
Arnaud Deparnay, Carl Zeiss Jena GmbH (Germany)
Falk Wirth, Carl Zeiss Jena GmbH (Germany)
Robert Brunner, Carl Zeiss Jena GmbH (Germany)

Published in SPIE Proceedings Vol. 5347:
Micromachining Technology for Micro-Optics and Nano-Optics II
Eric G. Johnson; Gregory P. Nordin, Editor(s)

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