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Proton beam writing of passive polymer optical waveguides
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Paper Abstract

Proton beam writing is a new direct-write micromachining technique capable of producing 3-dimensional (3-D), high aspect ratio micro-structures with straight and smooth sidewalls. It uses a focused sub-micron beam of 2.0 MeV protons to direct-write on a suitable polymer, such as the photoresists: poly-methylmethacrylate (PMMA) and SU-8, a negative tone photoresist from MicroChem. In this paper, we report on the application of proton beam writing to fabricate low-loss passive polymer waveguide structures such as symmetric y-branching waveguides in SU-8. SU-8 channel waveguides are fabricated by first direct-writing the pattern using a proton beam and subsequently chemically developing the latent image formed. A UV-cured resin, Norland Optical Adhesive 88 (NOA-88) is used as the cladding layer. Being a direct-write technique, proton beam writing offers us great flexibility to fabricate waveguides of arbitrary patterns and this is an asset that can be applied to the rapid prototyping of optical circuits. With all its unique characteristics, proton beam writing is an excellent technique for waveguide fabrication.

Paper Details

Date Published: 29 December 2003
PDF: 10 pages
Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); doi: 10.1117/12.524083
Show Author Affiliations
Tze Chien Sum, National Univ. of Singapore (Singapore)
Andrew A. Bettiol, National Univ. of Singapore (Singapore)
Soma Venugopal Rao, National Univ. of Singapore (Singapore)
Jeroen Anton van Kan, National Univ. of Singapore (Singapore)
Akkipeddi Ramam, Institute of Materials Research and Engineering (Singapore)
Frank Watt, National Univ. of Singapore (Singapore)

Published in SPIE Proceedings Vol. 5347:
Micromachining Technology for Micro-Optics and Nano-Optics II
Eric G. Johnson; Gregory P. Nordin, Editor(s)

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