Share Email Print
cover

Proceedings Paper

Characterization of thin metal oxide films grown by atomic layer deposition
Author(s): Peter J. Evans; Kathryn Prince; Gerry Triani; Kim S. Finnie; David R. G. Mitchell; Christophe J. Barbe
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Atomic layer deposition (ALD) is a versatile technique for producing a wide variety of thin films. It provides a method for precisely controlling film thickness and composition. In addition films produced by ALD are highly conformal and are therefore excellent for the generation of MEMS devices. In the present study, single and multi layer films of TiO2 and Al2O3 have been deposited on silicon substrates at 200 and 300°C. These films have been characterised by a number of surface analytical techniques including dynamic secondary ion mass spectrometry (SIMS), ion beam analysis, electron microscopy and spectroscopic ellipsometry. These methods have enabled the optical, chemical and structural properties of the films to be accurately assessed. The results obtained to date demonstrate that ALD produces highly uniform single and multi layer films with minimal impurities. These high quality films are being applied to new opportunities for the development of future MEMS devices.

Paper Details

Date Published: 2 April 2004
PDF: 7 pages
Proc. SPIE 5276, Device and Process Technologies for MEMS, Microelectronics, and Photonics III, (2 April 2004); doi: 10.1117/12.524052
Show Author Affiliations
Peter J. Evans, Australian Nuclear Science and Technology Organisation (Australia)
Kathryn Prince, Australian Nuclear Science and Technology Organisation (Australia)
Gerry Triani, Australian Nuclear Science and Technology Organisation (Australia)
Kim S. Finnie, Australian Nuclear Science and Technology Organisation (Australia)
David R. G. Mitchell, Australian Nuclear Science and Technology Organisation (Australia)
Christophe J. Barbe, Australian Nuclear Science and Technology Organisation (Australia)


Published in SPIE Proceedings Vol. 5276:
Device and Process Technologies for MEMS, Microelectronics, and Photonics III
Jung-Chih Chiao; Alex J. Hariz; David N. Jamieson; Giacinta Parish; Vijay K. Varadan, Editor(s)

© SPIE. Terms of Use
Back to Top