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Proceedings Paper

Design of a production process to enhance optical performance of 3ω optics
Author(s): Rahul R. Prasad; Justin R. Bruere; John M. Halpin; Phil Lucero; Steven Mills; Michael Bernacil; Richard P. Hackel
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Paper Abstract

Using the Phoenix pre-production conditioning facility we have shown that raster scanning of 3ω optics using a XeF excimer laser and mitigation of the resultant damage sites with a CO2 laser can enhance their optical damage resistance. Several large-scale (43 cm x 43 cm) optics have been processed in this facility. A production facility capable of processing several large optics a week has been designed based on our experience in the pre-production facility. The facility will be equipped with UV conditioning lasers -- 351-nm XeF excimer lasers operating at 100 Hz and 23 ns. The facility will also include a CO2 laser for damage mitigation, an optics stage for raster scanning large-scale optics, a damage mapping system (DMS) that images large-scale optics and can detect damage sites or precursors as small as ≈15 μm, and two microscopes to image damage sites with ≈5 μm resolution. The optics will be handled in a class 100 clean room, within the facility that will be maintained at class 1000.

Paper Details

Date Published: 10 June 2004
PDF: 7 pages
Proc. SPIE 5273, Laser-Induced Damage in Optical Materials: 2003, (10 June 2004); doi: 10.1117/12.523857
Show Author Affiliations
Rahul R. Prasad, Lawrence Livermore National Lab. (United States)
Justin R. Bruere, Lawrence Livermore National Lab. (United States)
John M. Halpin, Lawrence Livermore National Lab. (United States)
Phil Lucero, Lawrence Livermore National Lab. (United States)
Steven Mills, Lawrence Livermore National Lab. (United States)
Michael Bernacil, Lawrence Livermore National Lab. (United States)
Richard P. Hackel, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 5273:
Laser-Induced Damage in Optical Materials: 2003
Gregory J. Exarhos; Arthur H. Guenther; Norbert Kaiser; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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