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Proceedings Paper

Enhanced performance of large 3w optics using UV and IR lasers
Author(s): Rahul R. Prasad; Justin R. Bruere; John Peterson; John M. Halpin; Michael Borden; Richard P. Hackel
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Paper Abstract

We have developed techniques using small-beam raster scanning to laser-condition fused silica optics to increase their damage threshold. Further, we showed that CO2 lasers could be used to mitigate and stabilize damage sites while still on the order of a few tens of microns in size, thereby greatly increasing the lifetime of an optic. We recently activated the Phoenix pre-production facility to condition and mitigate optics as large as 43 cm x 43 cm. Several full-scale optics have been processed in Phoenix. The optics were first photographed using a damage mapping system to identify scratches, digs, or other potential sites for initiation of laser damage. We then condition the optic, raster scanning with the excimer laser. The first scan is performed at a low fluence. A damage map is then acquired and any new damage sites or any sites that have grown in size are mitigated using the CO2 laser. The process is repeated at successively higher fluences until a factor of 1.7 above the nominal operating fluence is reached. After conditioning, optics were tested in a large beam 3ω laser and showed no damage at fluences of 8 J/cm2 average.

Paper Details

Date Published: 10 June 2004
PDF: 8 pages
Proc. SPIE 5273, Laser-Induced Damage in Optical Materials: 2003, (10 June 2004); doi: 10.1117/12.523853
Show Author Affiliations
Rahul R. Prasad, Lawrence Livermore National Lab. (United States)
Justin R. Bruere, Lawrence Livermore National Lab. (United States)
John Peterson, Lawrence Livermore National Lab. (United States)
John M. Halpin, Lawrence Livermore National Lab. (United States)
Michael Borden, Lawrence Livermore National Lab. (United States)
Richard P. Hackel, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 5273:
Laser-Induced Damage in Optical Materials: 2003
Gregory J. Exarhos; Arthur H. Guenther; Norbert Kaiser; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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