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Proceedings Paper

Photothermal multipixel imaging microscope
Author(s): Christopher J. Stolz; Diane J. Chinn; Robert D. Huber; Carolyn L. Weinzapfel; Zhouling Wu
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Paper Abstract

Photothermal microscopy is a useful nondestructive tool for the identification of fluence-limiting defects in optical coatings. Traditional photothermal microscopes are single-pixel detection devices. Samples are scanned under the microscope to generate a defect map. For high-resolution images, scan times can be quite long (1 mm2 per hour). Single-pixel detection has geen used traditionally because of the ease in separating the laser-induced topographical change due to defect absorption from the defect surface topography. This is accomplished by using standard chopper and lock-in amplifier techniques to remove the DC signal. Multi-pixel photothermal microscopy is now possible by utilizing an optical lock-in technique. This eliminates the lock-in amplifier and enables the use of a CCD camera with an optical lock in for each pixel. With this technique, the data acquisition speed can be increased by orders of magnitude depending on laser power, beam size, and pixel density.

Paper Details

Date Published: 10 June 2004
PDF: 6 pages
Proc. SPIE 5273, Laser-Induced Damage in Optical Materials: 2003, (10 June 2004); doi: 10.1117/12.523669
Show Author Affiliations
Christopher J. Stolz, Lawrence Livermore National Lab. (United States)
Diane J. Chinn, Lawrence Livermore National Lab. (United States)
Robert D. Huber, Lawrence Livermore National Lab. (United States)
Carolyn L. Weinzapfel, Lawrence Livermore National Lab. (United States)
Zhouling Wu, ValuTech Corp. (United States)


Published in SPIE Proceedings Vol. 5273:
Laser-Induced Damage in Optical Materials: 2003
Gregory J. Exarhos; Arthur H. Guenther; Norbert Kaiser; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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