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Proceedings Paper

Single-shot and multishot laser-induced damage of HfO2/SiO2 multilayer at YAG third harmonic
Author(s): Yuanan Zhao; Zhaosheng Tang; Jianda Shao; Zhengxiu Fan
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Paper Abstract

HfO2/SiO2 dielectric mirrors for 355 nm, prepared by conventional electron beam deposition, had been investigated with respect to their laser damage resistance. Two kinds of HfO2 with different purity were chosen as the high index material, whose impurity contents were evaluated by Glow Discharge Mass Spectrometer (GDMS) and X-ray Photoelectron Spectroscopy (XPS). Laser damage testing was performed both in the “1-on-1” and the “s-on-1” regime, using 355 nm pulsed laser with a pulse width of 8 ns. It was found that the laser induced damage threshold (LIDT) for single-shot was much higher than that for multishot. A phenomenon displayed that the impurity of zirconium was a critical hindrance in improving the LIDT in the single-shot process, but such an effect was not shown in the multishot process. The damage mechanism is different in the two manner of radiation, the main cause of the damage in single-shot is impurity absorption and that in the multishot is accumulation of structural defects. Optical microscopy and surface profiler was employed in mapping laser-induced damage morphology features after irradiation.

Paper Details

Date Published: 10 June 2004
PDF: 7 pages
Proc. SPIE 5273, Laser-Induced Damage in Optical Materials: 2003, (10 June 2004); doi: 10.1117/12.522783
Show Author Affiliations
Yuanan Zhao, Shanghai Institute of Optics and Fine Mechanics (China)
Zhaosheng Tang, Shanghai Institute of Optics and Fine Mechanics (China)
Jianda Shao, Shanghai Institute of Optics and Fine Mechanics (China)
Zhengxiu Fan, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 5273:
Laser-Induced Damage in Optical Materials: 2003
Gregory J. Exarhos; Arthur H. Guenther; Norbert Kaiser; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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