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Proceedings Paper

Temperature-dependent characteristics of diffused and polysilicon resistors for ULSI applications
Author(s): Hung-Ming Chuang; Shiou-Ying Cheng; Jing-Yuh Chen; Chun-Yuan Chen; Sheng-Fu Tsai; Yan-Ying Tsai; Wei-Hsi Hsu; Ching-Wen Hong; Chun-Wei Chen; Wen-Chau Liu
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Proc. SPIE 5274, Microelectronics: Design, Technology, and Packaging, ; doi: 10.1117/12.522263
Show Author Affiliations
Hung-Ming Chuang, National Cheng Kung Univ. (Taiwan)
Shiou-Ying Cheng, Oriental Institute of Technology (Taiwan)
Jing-Yuh Chen, National Cheng Kung Univ. (Taiwan)
Chun-Yuan Chen, National Cheng Kung Univ. (Taiwan)
Sheng-Fu Tsai, National Cheng Kung Univ. (Taiwan)
Yan-Ying Tsai, National Cheng Kung Univ. (Taiwan)
Wei-Hsi Hsu, National Cheng Kung Univ. (Taiwan)
Ching-Wen Hong, National Cheng Kung Univ. (Taiwan)
Chun-Wei Chen, National Cheng Kung Univ. (Taiwan)
Wen-Chau Liu, National Cheng Kung Univ. (Taiwan)


Published in SPIE Proceedings Vol. 5274:
Microelectronics: Design, Technology, and Packaging
Derek Abbott; Kamran Eshraghian; Charles A. Musca; Dimitris Pavlidis; Neil Weste, Editor(s)

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