Share Email Print
cover

Proceedings Paper

Analog micro-optics fabrication by use of a binary phase grating mask
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

In this paper, we present a new photo-mask technology capable of forming a continuous relief micro-optic profile on thick photo-resist. This technique eliminates many of the drawbacks of gray-scale and half-tone masking technology. An optical stepper is used to fabricate binary phase gratings of pi phase depth on a transparent quartz reticle. When the phase reticle is used in the stepper an analog intensity profile is created on the wafer. The period is constrained allowing for control of the 0th order in the stepper. The duty cycle of the phase gratings can be varied in such a way to provide the proper analog intensity profile for a wide range of micro-optics on the photo-resist. The design, analysis, and fabrication procedures of this technique will be discussed.

Paper Details

Date Published: 29 December 2003
PDF: 9 pages
Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); doi: 10.1117/12.522221
Show Author Affiliations
Jinwon Sung, CREOL/Univ. of Central Florida (United States)
Mahesh Pitchumani, CREOL/Univ. of Central Florida (United States)
Jeremiah Brown, CREOL/Univ. of Central Florida (United States)
Heidi Hockel, CREOL/Univ. of Central Florida (United States)
Eric G. Johnson, CREOL/Univ. of Central Florida (United States)


Published in SPIE Proceedings Vol. 5347:
Micromachining Technology for Micro-Optics and Nano-Optics II
Eric G. Johnson; Gregory P. Nordin, Editor(s)

© SPIE. Terms of Use
Back to Top