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Proceedings Paper

Localized silica re-fusion for laser damage mitigation
Author(s): Philippe R. Bouchut; Laurence Delrive; Daniel Decruppe; Pierre Garrec
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Paper Abstract

A continuous CO2 laser is used to locally re-fuse silica and avoid growth of 3ω laser damaged sites. Temperature evolution on each spot is monitored by a radiometry diagnostic. Important temperature variations are observed from site to site at a mm scale. Such variations can only be induced by a non homogeneous, high temperature, thermal conductivity. Real time retroaction, on silica exposure to laser radiation, enables us to control surface silica evaporation and etching depth. The 3ω laser induced damage threshold test of the re-fused sites shows that the limit for the mitigation rate lies in the surrounding silica surface.

Paper Details

Date Published: 10 June 2004
PDF: 8 pages
Proc. SPIE 5273, Laser-Induced Damage in Optical Materials: 2003, (10 June 2004); doi: 10.1117/12.521861
Show Author Affiliations
Philippe R. Bouchut, CEA-LETI (France)
Laurence Delrive, CEA-LETI (France)
Daniel Decruppe, CEA-LETI (France)
Pierre Garrec, CEA-LETI (France)


Published in SPIE Proceedings Vol. 5273:
Laser-Induced Damage in Optical Materials: 2003
Gregory J. Exarhos; Arthur H. Guenther; Norbert Kaiser; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz, Editor(s)

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