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Proceedings Paper

The pickup of ion beam etching depth information during microfabrication
Author(s): Guangxing Zhao; Yan Wang
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Paper Abstract

Based on scalar quantity diffraction theory, the phase grating of micro-optics structure is studied. The light intensity distribution of diffraction fields is obtained. Results show that the peak position of light intensity moved with the variation of ion beam etching depth. The conclusion can be used in the pick-up of etching depth information during micro-fabrication, and it has important significance in ion beam etching depth's accurate control.

Paper Details

Date Published: 2 September 2003
PDF: 3 pages
Proc. SPIE 5253, Fifth International Symposium on Instrumentation and Control Technology, (2 September 2003); doi: 10.1117/12.521773
Show Author Affiliations
Guangxing Zhao, Anhui Univ. of Technology (China)
Yan Wang, Anhui Univ. of Technology (China)


Published in SPIE Proceedings Vol. 5253:
Fifth International Symposium on Instrumentation and Control Technology
Guangjun Zhang; Huijie Zhao; Zhongyu Wang, Editor(s)

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