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Proceedings Paper

Identification and elimination of trench crystal defects in sub-0.13-um era
Author(s): Chun-Chen Yeh; Chung-Chen Chen; Tser-Hua Lu; Chia-Ming Shen; Jong-Hsian Chuang; Jon Lee; Chiang Fu; Ya-Dien Sheu
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Paper Abstract

A series of study of trench dislocation occurred in 0.13/0.18um CMOS technologies have been done. First, it is demonstrated for the first time that trench crystal dislocations can be detected successfully using current mapping atomic force microscopy (C-AFM). Different from conventional voltage contrast technique, which uses SEM image brightness for the comparison of leaky contacts/junctions and normal ones, C-AFM probes the surface of samples by contacting them directly and can provide I-V curve mapping data for each contact/junction where the needle passes. Thus a quantified contact/junction leakage current data is acquired and can be used to find out minor trench dislocation (located beneath the leaky contact), which works as a leakage source negligible before but crucial in 0.13um low power devices. Besides, a model concerning about the FEOL overall thermal budget is proposed to explain the formation of trench dislocations.

Paper Details

Date Published: 2 April 2004
PDF: 5 pages
Proc. SPIE 5276, Device and Process Technologies for MEMS, Microelectronics, and Photonics III, (2 April 2004); doi: 10.1117/12.521724
Show Author Affiliations
Chun-Chen Yeh, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Chung-Chen Chen, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Tser-Hua Lu, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Chia-Ming Shen, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Jong-Hsian Chuang, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Jon Lee, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Chiang Fu, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Ya-Dien Sheu, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)


Published in SPIE Proceedings Vol. 5276:
Device and Process Technologies for MEMS, Microelectronics, and Photonics III
Jung-Chih Chiao; Alex J. Hariz; David N. Jamieson; Giacinta Parish; Vijay K. Varadan, Editor(s)

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