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Proceedings Paper

Study on thermal control of x-ray mask during post-exposure bake
Author(s): Yongkun Wang; Jianzu Yu; Lei Yu; Dapeng Chen
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Paper Abstract

The temperature distribution on the surface of the mask, during post exposure bake (PEB) of the X-ray mask after electron beam writing (EBW), is very important for controlling the mask critical dimension(CD). In this paper, three-dimensional finite element (FE) thermal model of the X-ray mask has been set up. The results of the numerical simulation indicate that it will take 2.16 seconds for PEB to get thermal steady when the boundary conditions of the top surface of the resist are natural convections, and that the temperature distribution of the mask is non-uniform, and the maximum temperature difference is 10.19°C, which will most likely make the resist at the high temperature region baked excessively. By using insulation measures, the boundary conditions of the top surface of the resist are changed to adiabatic conditions, and the temperature distribution of the mask is very uniform, which will reduce the influence on the absorber CD from PEB.

Paper Details

Date Published: 2 September 2003
PDF: 5 pages
Proc. SPIE 5253, Fifth International Symposium on Instrumentation and Control Technology, (2 September 2003); doi: 10.1117/12.521406
Show Author Affiliations
Yongkun Wang, Beijing Univ. of Aeronautics and Astronautics (China)
Jianzu Yu, Beijing Univ. of Aeronautics and Astronautics (China)
Lei Yu, Beijing Univ. of Aeronautics and Astronautics (China)
Dapeng Chen, Microelectronics R&D Ctr. of the Chinese Academy of Sciences (China)


Published in SPIE Proceedings Vol. 5253:
Fifth International Symposium on Instrumentation and Control Technology
Guangjun Zhang; Huijie Zhao; Zhongyu Wang, Editor(s)

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