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Proceedings Paper

Toward large-area simulation of e-beam lithography
Author(s): Martin Bohn; Ulrich Hofmann; Wolfgang Hoppe; Christopher J. Progler; Michael Ryzhoukhin
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Paper Abstract

As in optical lithography, E-beam lithography is facing a multitude of issues, both in mask making and in direct write applications. These issues range from pattern printability and design verifications to tool and process optimizations. Simulation can be used to address these issues, however its applicability was limited due to limitations in the usable simulation area. Advances in the mathematical models lead to a significant speedup of the simulation, enabling the simulation of larger areas. This paper will demonstrate the applicability of the new simulator on a few key examples, such as aggressive mask challenges, model to experiment correlations as well as its application to direct write.

Paper Details

Date Published: 17 December 2003
PDF: 6 pages
Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.520812
Show Author Affiliations
Martin Bohn, SIGMA-C GmbH (United States)
Ulrich Hofmann, SIGMA-C GmbH (Germany)
Wolfgang Hoppe, SIGMA-C GmbH (Germany)
Christopher J. Progler, Photronics, Inc. (United States)
Michael Ryzhoukhin, SIGMA-C GmbH (Germany)

Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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