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Proceedings Paper

Deposition parameters influences in pulsed laser deposition by plume reflection
Author(s): Aurelian Marcu; Constantin Grigoriu; Weihua Jiang; Kiyoshi Yatsui
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Paper Abstract

Pulsed laser deposition (PLD) is widely used to prepare various kinds of thin films. From many experimental results the film surface has been found to be strongly affected by so-called droplets, which are relatively large target material particles in solid or liquid state carried with the plume. In order to satisfy both purposes of high deposition rate and good quality by the PLD, we have investigated the plume reflection process from the viewpoint to avoid the big particles deposited on the substrate. In the present paper we investigate the influences of the system parameters on surface thin film quality and the deposition rate. Some optimization proposals are also included for this deposition technique.

Paper Details

Date Published: 30 September 2003
PDF: 6 pages
Proc. SPIE 5227, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies, (30 September 2003); doi: 10.1117/12.520070
Show Author Affiliations
Aurelian Marcu, National Institute for Lasers, Plasma, and Radiation Physics (Romania)
Constantin Grigoriu, National Institute for Lasers, Plasma, and Radiation Physics (Romania)
Weihua Jiang, Nagaoka Univ. of Technology (Japan)
Kiyoshi Yatsui, Nagaoka Univ. of Technology (Japan)


Published in SPIE Proceedings Vol. 5227:
Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies
Ovidiu Iancu; Adrian Manea; Dan Cojoc, Editor(s)

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