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Proceedings Paper

Fourier optic imaging equations for the immersion case
Author(s): Peter D. Brooker
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Paper Abstract

The purpose of this paper is to extend the Fourier optic imaging equations to the case of immersion lithography. Specifically, the paper will derive the equation describing the complex amplitude at the wafer plane for both the immersion case and the non immersion case. By comparing the two equations, a parameter transformation will be explicitly derived that allows the equation for the non immersion case to describe the immersion case. With these transformations, lithography simulators such as SOLID-C can be used to accurately model immersion lithography.

Paper Details

Date Published: 17 December 2003
PDF: 8 pages
Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.518884
Show Author Affiliations
Peter D. Brooker, SIGMA-C (United States)


Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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