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Measurement strategy for 157-nm hard pellicles, reticles, and assembled pellicle-reticles
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Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, ; doi: 10.1117/12.518706
Show Author Affiliations
Leslie L. Deck, Zygo Corp. (United States)
Richard D. Eandi, Zygo Corp. (United States)


Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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