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Proceedings Paper

Techniques for maximizing yield in nanometer designs
Author(s): John Ferguson
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Paper Abstract

As designs grow more complex, process technologies become smaller, and geometry counts increase, the work required to achieve acceptable yeild becomes increasingly demanding and difficult. Underlying this state of affairs is the need to maximize yield without increasing manufacturing costs. This paper addresses techniques for increasing yield as well as suggestions for determining whether yield enhancement techniques are cost effective.

Paper Details

Date Published: 17 December 2003
PDF: 5 pages
Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.518564
Show Author Affiliations
John Ferguson, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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