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Proceedings Paper

Development of a new PSM film system for 157-nm extensible to high-transmission 193 nm lithography
Author(s): Hans W. Becker; Jay Chey; Frank Sobel; Frank Schmidt; Markus Renno; Ute Buttgereit; Marie Angelopoulos; Guenter Hess; Konrad Knapp
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Paper Abstract

A new attenuated phase shifting film system for 157 nm lithography is presented. The system is designed for 6% transmission but is tunable to higher values. Tests for laser stability and chemical durability show excellent performance. First results of defect density and phase and transmission homogeneity are presented. The phase shifting film achieves a high etch selectivity to the substrate. The film system is extensible to be used as a high transmission phase shifter for 193 nm lithography. Further it is feasible to repair the film system using electron beam repair technology.

Paper Details

Date Published: 17 December 2003
PDF: 9 pages
Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.518339
Show Author Affiliations
Hans W. Becker, Schott Lithotec AG (Germany)
Jay Chey, IBM Thomas J. Watson Research Ctr. (United States)
Frank Sobel, Schott Lithotec AG (Germany)
Frank Schmidt, Schott Lithotec AG (Germany)
Markus Renno, Schott Lithotec AG (Germany)
Ute Buttgereit, Schott Lithotec AG (Germany)
Marie Angelopoulos, IBM Thomas J. Watson Research Ctr. (United States)
Guenter Hess, Schott Lithotec AG (Germany)
Konrad Knapp, Schott Lithotec AG (Germany)


Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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