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Proceedings Paper

Process monitoring of chrome dry-etching with RF sensor for reticle production beyond 90-nm node
Author(s): Hitoshi Handa; Satoshi Yamauchi; Hiroshi Maruyama; Satoshi Ishimoto; Makoto Kosugi; Yutaka Miyahara; Toshifumi Uryu; Toshifumi Yokoyama; Akihiko Naito
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Paper Abstract

In reticle production for 90-nm node generation and beyond, quite strict chrome CD control is strongly demanded. For chrome dry-etching process, esetablishment of reliable system for chrome endpoint detection is one of critical issues. In this paper, the effectiveness of radio frequency (RF) sensor as a process monitor for chrome dry-etching was examined. As general endpoint detection system, such as Laser endpoint detection (Laser EPD) and optical emission spectroscopy (OES), the system based on RF sensor shows the ability to get chrome endpoint. Experimental data implied its competence as an endpoint detector for the plates of various chrome loads with enough stability and reliability. Moreover, this sensor has an advantage that plasma impedance observed with the sensor has a correlation with etching performance, such as etching bias and its uniformity. This property is useful, because feedback of the variation of sensor output to process condition is able to play important role in control of reticle CD. As a consequence, the concept of advanced process control based on the RF sensor is proposed.

Paper Details

Date Published: 17 December 2003
PDF: 8 pages
Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.518337
Show Author Affiliations
Hitoshi Handa, Fujitsu Ltd. (Japan)
Satoshi Yamauchi, Fujitsu Ltd. (Japan)
Hiroshi Maruyama, Fujitsu Ltd. (Japan)
Satoshi Ishimoto, Fujitsu Ltd. (Japan)
Makoto Kosugi, Fujitsu Ltd. (Japan)
Yutaka Miyahara, Fujitsu Ltd. (Japan)
Toshifumi Uryu, Dai Nippon Printing Co., Ltd. (Japan)
Toshifumi Yokoyama, Dai Nippon Printing Co., Ltd. (Japan)
Akihiko Naito, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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