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Proceedings Paper

Fine pixel CD-SEM for measurements of two-dimensional patterns
Author(s): Shinji Yamaguchi; Masamitsu Itoh; Takahiro Ikeda; Yumiko Miyano; Tadashi Mitsui; Masuo Amma; Shoichi Horikawa
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Paper Abstract

A fine pixel CD-SEM system is developed. The convnetional CD-SEM Topcon MI-3080UR system consists of main body, 512 pixel SEM image acquisition system and 1D pattern size measurement system. The fine pixel CD-SEM system is added the conventional CD-SEM TOPCON MI-3080UR system. The fine pixel CD-SEM system consists of 2048pixel SEM image acquisition system is used by adjusting a novel measurement algorithm for the SEM image of 2D patterns. Firstly, the necessity of the fine pixel CD-SEM is discussed from the viewpoint of getting good repeatability of pattern size measurements. Effective factors causing the good repeatability for pattern size measurements are studied. The effective factors are mainly SEM image quality and pattern measurement algorithm. Secondly, repeatability of 2D pattern measurements by using the developed fine pixel CD-SEM image and the novel algorithm are evaluated. The evaluated 2D patterns are used for hammer head type OPC patterns for DRAM cell pattern. Finally, we investigate the usefulness of the fine pixel CD-SEM by usign the same novel algorithm for comparison of the conventional and the fine pixel CD-SEM.

Paper Details

Date Published: 17 December 2003
PDF: 12 pages
Proc. SPIE 5256, 23rd Annual BACUS Symposium on Photomask Technology, (17 December 2003); doi: 10.1117/12.518289
Show Author Affiliations
Shinji Yamaguchi, Toshiba Corp. (Japan)
Masamitsu Itoh, Toshiba Corp. (Japan)
Takahiro Ikeda, Toshiba Corp. (Japan)
Yumiko Miyano, Toshiba Corp. (Japan)
Tadashi Mitsui, Toshiba Corp. (Japan)
Masuo Amma, Topcon Corp. (Japan)
Shoichi Horikawa, Topcon Corp. (Japan)

Published in SPIE Proceedings Vol. 5256:
23rd Annual BACUS Symposium on Photomask Technology
Kurt R. Kimmel; Wolfgang Staud, Editor(s)

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